Parameter-interval estimation for cooperative reactive sputtering processes
arXiv:2603.25602
Abstract
Reactive sputtering is a plasma-based technique to deposit a thin film on a substrate. This contribution presents a novel parameter-interval estimation method for a well-established model that describes the uncertain and nonlinear reactive sputtering process behaviour. Building on a proposed monotonicity-based model classification, the method guarantees that all parameter values within the parameter interval yield output trajectories and static characteristics consistent with the enclosure induced by the parameter interval. Correctness and practical applicability of the new method are demonstrated by an experimental validation, which also reveals inherent structural limitations of the well-established process model for state-estimation tasks.
Final accepted manuscript for the IFAC World Congress 2026