Epitaxial growth of topological insulator -Ag2Te thin films
arXiv:2603.15406
Abstract
We report epitaxial growth of -Ag2Te thin films by molecular beam epitaxy. -Ag2Te, recently identified as a topological insulator, was grown by depositing Ag on InP substrate at room temperature followed by Te supply at elevated temperature. X-ray diffraction measurements and transmission electron microscopy analyses confirmed the (002) crystal orientation and the epitaxial atomic arrangement of -Ag2Te thin films. Electrical transport measurements revealed that the -Ag2Te thin film exhibits two-dimensional metallic conduction while the bulk remains insulating. The epitaxial -Ag2Te thin films obtained here provide a viable platform for investigating emergent phenomena arising from surface Dirac states and for designing heterojunction-based device structures.
19 pages, 4 figures