paper

Controlling Mixed Mo/MoS Domains on Si by Molecular Beam Epitaxy for the Hydrogen Evolution Reaction

arXiv:2601.16738 · doi:10.1021/acsnano.5c19478

Abstract

Molybdenum disulfide (MoS) is a prototypical layered transition-metal dichalcogenide whose electrocatalytic performance is governed by a delicate balance between crystallinity, defect density, and electronic conductivity. Here we report a systematic molecular beam epitaxy (MBE) study in which annealing temperature, deposition cycle number, and Mo/S thickness ratio were independently varied to control the structural and electronic properties of MoS thin films. The successful epitaxial growth of atomically uniform MoS directly on Si substrates enables strong interfacial coupling and efficient charge transfer, offering a viable route toward semiconductor-integrated catalytic architectures. X-ray diffraction, Raman spectroscopy, and X-ray absorption analyses reveal that higher annealing temperatures and excessive deposition cycles enhance crystallinity but reduce edge-site density and electrical conductivity, leading to diminished hydrogen evolution reaction (HER) activity. In contrast, intermediate cycle numbers and sulfur-deficient growth conditions yield heterostructures composed of MoS with residual metallic Mo and sulfur vacancies, which activate otherwise inert basal planes while providing conductive pathways. These defect-engineered films deliver the best catalytic performance, achieving overpotentials as low as -0.33 V at -10 mA cm, enlarged electrochemical surface area (ECSA) up to 8.0 cm, and mass-based turnover frequencies exceeding 23 mmol H g s, more than double those of stoichiometric counterparts. Our findings establish sulfur stoichiometry and growth kinetics as powerful levers to tune the interplay between structural order and catalytic activity in MBE-grown MoS and point toward a broader strategy for engineering layered catalysts at the atomic scale.

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