Epitaxial thin film growth in the U-Ge binary system

Abstract

We explore the U-Ge phase diagram using thin film growth by co-deposition of U and Ge via d.c. magnetron sputtering. Using three different single crystal substrates - MgO, CaF${}_2$ and SrTiO${}_3$ - we have stabilised mixed phase films of mostly UGe${}_3$ and UGe, with evidence of UGe${}_2$ as well. At higher temperatures UO${}_2$ forms as a consequence of gettering of oxygen from several types of substrate. Several UGe${}_3$ dominated samples grown on MgO substrates have also been characterised electrically, showing residual resistivity ratios up to six.

15 pages, 9 figures