Scalable High-Precision Microfabrication on Various Lithography-Incompatible Substrates and Materials Enabled by Wafer-Scale Transfer Lithography of Commercial Photoresists
arXiv:2504.15078
Abstract
Photolithography conventionally requires flat, rigid and stable substrates, limiting its applications in flexible, curved, and transient electronics. In this study, a breakthrough approach is reported that employs a reversibly adhesion-switchable phase-changing polymer to universally transfer commercial photoresists onto previously inaccessible substrates, overcoming fundamental limitations of conventional photolithography.
11 pages,