Hybrid confinement techniques for polariton simulators

Abstract

Exciton-polariton III-V semiconductor microcavities provide a robust platform for emulating complex Hamiltonians, enabling topological photonics and quantum simulation for advanced photonic functionalities. Here, we introduce two novel fabrication techniques - etch-and-oversputter and deposit-and-oversputter - that overcome limitations of traditional photonic confinement. Both use structured, locally elongated semiconductor cavities to create deep, highly controllable potentials, while leveraging high-quality GaAs-based materials, which achieve excellent Q-factors. A sputtered all-dielectric top mirror introduces an innovative hybrid approach, simplifying fabrication while maintaining quality compared to deep ion etching. Utilizing a Kagome lattice as a benchmark, we show high-quality optical band structures previously inaccessible with deep etching. Furthermore, we study a two-dimensional breathing Kagome lattice and demonstrate polariton lasing from a zero-dimensional corner mode, confirming precise control over couplings and tight polariton localization. These methods enable fabrication of intricate lattices, including higher-order topological insulators, or on-chip quantum regimes utilizing the polariton blockade mechanism due to tight photonic confinement.