Sputtering Current Driven Growth & Transport Characteristics of Superconducting Ti40V60 Alloy Thin Films
arXiv:2501.00812 · doi:10.1063/5.0254169
Abstract
The room temperature growth, characterization, and electrical transport properties of magnetron sputtered superconducting Ti40V60 alloy thin films are presented. The films exhibit low surface roughness and tunable transport properties. As the sputtering current increases, the superconducting transition move towards higher temperatures. Rietveld refinement of two dimensional XRD (2D XRD) pattern reveals the presence of stress in the films, which shifts from tensile to compressive as the sputtering current increases. Additionally, the crystallite size of the films increases with higher sputtering currents. The films exhibit a strong preferential orientation, contributing to their texturing. The crystallite size and texturing are found to be correlated with the superconducting transition temperature (TC) of the films. As the crystallite size and texturing increase, the TC of the films also rises.
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Cited by in corpus (3)
- Growth Optimization of MoSi Thin Film and Measurement of Transport Critical Current Density of its Meander Structure
- Effect of Underlayer Induced Charge Carrier Substitution on the Superconductivity of Ti40V60 Alloy Thin Films
- Effect of Deposition Pressure on the Superconductivity of Ti40V60 Alloy Thin Films