Determining intrinsic sensitivity and the role of multiple scattering in speckle metrology
arXiv:2403.19301 · doi:10.1038/s42254-024-00735-y
Abstract
Speckle patterns are a powerful tool for high-precision metrology, as they allow remarkable performance in relatively simple setups. Nonetheless, researchers in this field follow rather distinct paths due to underappreciated general principles underlying speckle phenomena. Here, we advise on a universal metric of intrinsic speckle sensitivity, and on the advantages and disadvantages of multiple scattering. This will catalyse progress in speckle metrology but will also translate to other domains of disordered optics which are undergoing rapid developments at present.
15 pages, 4 figures
References in corpus (8)
- Non-line-of-sight Imaging
- Harnessing speckle for a sub-femtometre resolved broadband wavemeter and laser stabilization
- Deep Learning Enabled Real Time Speckle Recognition and Hyperspectral Imaging using a Multimode Fiber Array
- Tailoring 3D Speckle Statistics
- Wavelength sensitivity of the speckle patterns produced by an integrating sphere
- Coherent enhancement of optical remission in diffusive media
- 3D stochastic interferometer detects picometer deformations and minute dielectric fluctuations of its optical volume
- Role of Multiple Scattering in Single Particle Perturbations in Absorbing Random Media