paper

Atomic-scale investigation of -GaO deposited on MgAlO and its relationship with -GaO

arXiv:2310.12493

Abstract

Nominally phase-pure - was deposited on (100) within a narrow temperature window centered at 470 C using metal-organic chemical vapor deposition (MOCVD). The film deposited at 440 C exhibited either poor crystallization or an amorphous structure; the film grown at 500 C contained both - and -. A nominally phase-pure - film was obtained at 530 C. Atomic-resolution scanning transmission electron microscopy (STEM) investigations of the - film grown at 470 C revealed a high density of antiphase boundaries. A planar defect model developed for - was extended to explain the stacking sequences of the Ga sublattice observed in the STEM images of -. The presence of the 180 rotational domains and 90 rotational domains of - inclusions within the - matrix is discussed within the context of a comprehensive investigation of the epitaxial relationship between those two phases in the as-grown film at 470 C and the same film annealed at 600 C. The results led to the hypotheses that (i) incorporation of certain dopants including Si, Ge, Sn, Mg, Al, and Sc, into -, locally stabilizes the "-phase" and (ii) the site preference(s) for these dopants promotes the formation of the "-phase" and/or - solid solutions. However, in the absence of such dopants, pure - remains the least stable polymorph, as indicated by its very narrow growth window, lower growth temperatures relative to other polymorphs, and the largest calculated difference in Helmholtz free energy per formula unit between - and - than all other polymorphs.

The following article has been submitted to APL Materials