Epitaxial growth and electronic structure of Ruddlesden-Popper nickelates (${\mathrm{La}}_{n+1}{\mathrm{Ni}}_n{\mathrm{O}}_{3n+1},n=1-5$)

Abstract

We report the epitaxial growth of Ruddlesden-Popper nickelates, ${\mathrm{La}}_{n+1}{\mathrm{Ni}}_n{\mathrm{O}}_{3n+1}$, with $n$ up to 5 by reactive molecular beam epitaxy (MBE). X-ray diffractions indicate high crystalline quality of these films and transport measurements show strong dependence on the $n$ values. Angle-resolved photoemission spectroscopy (ARPES) reveals the electronic structure of ${\mathrm{La}}_5{\mathrm{Ni}}_4{\mathrm{O}}_{13}$, showing a large hole-like pocket centered around the Brillouin zone corner with a $(\pi ,\pi )$ back-folded copy.

11 pages, 4 figures

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Cited by in corpus (5)

• Electronic structure and magnetic properties of higher-order layered nickelates: La${}_{n+1}$Ni${}_n$O${}_{2n+2}$ ($n=4-6$)
• Synthesis and electronic properties of Nd${}_{n+1}$Ni${}_n$O${}_{3n+1}$ Ruddlesden-Popper nickelate thin films
• Limits to the strain engineering of layered square-planar nickelate thin films
• Electronic structure of higher-order Ruddlesden-Popper nickelates
• Emergent flat-band physics in $d^{9-\delta }$ multilayer nickelates