Direct-write projection lithography of quantum dot micropillar single photon sources

Abstract

We have developed a process to mass-produce quantum dot micropillar cavities using direct-write lithography. This technique allows us to achieve high volume patterning of high aspect ratio pillars with vertical, smooth sidewalls maintaining a high quality factor for diameters below 2.0 $\mu$m. Encapsulating the cavities in a thin layer of oxide (Ta${}_2$O${}_5$) prevents oxidation in the atmosphere, preserving the optical properties of the cavity over months of ambient exposure. We confirm that single dots in the cavities can be deterministically excited to create high purity indistinguishable single photons with interference visibility $(96.2\pm 0.7)\%$.

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Cited by in corpus (3)

• Probing Purcell enhancement and photon collection efficiency of InAs quantum dots at nodes of the cavity electric field
• Design principles for >90% efficiency and >99% indistinguishability broadband quantum dot cavities
• The origin and influence of non-cavity modes in a micropillar Bragg microcavity