Photonic integration of lithium niobate micro-ring resonators onto silicon nitride waveguide chips by transfer-printing
arXiv:2208.12192 · doi:10.1364/OME.474200
Abstract
The heterogeneous integration of lithium niobate photonic waveguide devices onto a silicon nitride waveguide platform via a transfer-printing approach has been demonstrated for the first time. A fabrication process was developed to make free-standing lithium niobate membrane devices compatible with back-end integration onto photonic integrated circuits. Micro-ring resonators in membrane format were lithographically defined by using laser direct writing and plasma dry etching. The lithium niobate micro-ring resonators were then transferred from their host substrate and released onto a silicon nitride waveguide chip. An all-pass ring resonator transmission spectrum was obtained in the 1.5 μm to 1.6 μm wavelength range, with a measured loaded Q-factor larger than 32000.
8 pages, 6 figures