Porous SiO${}_2$ coated dielectric metasurface with consistent performance independent of environmental conditions

Abstract

With the rapid advances of functional dielectric metasurfaces and their integration on on-chip nanophotonic devices, the necessity of metasurfaces working in different environments, especially in biological applications, arose. However, the metasurfaces' performance is tied to the unit cell's efficiency and ultimately the surrounding environment it was designed for, thus reducing its applicability if exposed to altering refractive index media. Here, we report a method to increase a metasurface's versatility by covering the high-index metasurface with a low index porous SiO${}_2$ film, protecting the metasurface from environmental changes while keeping the working efficiency unchanged. We show, that a covered metasurface retains its functionality even when exposed to fluidic environments.

References in corpus (5)

• Metasurface holography: from fundamentals to applications
• Optical secret sharing with cascaded metasurface holography
• Nonlinear imaging with all-dielectric metasurfaces
• A Dielectric Metasurface Optical Chip for the Generation of Cold Atoms
• All-dielectric silicon metalens for two-dimensional particle manipulation in optical tweezers