Molecular Beam Epitaxy growth of MoTe on Hexagonal Boron Nitride
arXiv:2111.12433 · doi:10.1016/j.jcrysgro.2022.126806
Abstract
Hexagonal boron nitride has already been proven to serve as a decent substrate for high quality epitaxial growth of several 2D materials, such as graphene, MoSe, MoS or WSe. Here, we present for the first time the molecular beam epitaxy growth of MoTe on atomically smooth hexagonal boron nitride (hBN) substrate. Occurrence of MoTe in various crystalline phases such as distorted octahedral 1T' phase with semimetal properties or hexagonal 2H phase with semiconducting properties opens a possibility of realisation of crystal-phase homostructures with tunable properties. Atomic force microscopy studies of MoTe grown in a single monolayer regime enable us to determine surface morphology as a function of the growth conditions. The diffusion constant of MoTe grown on hBN can be altered 5 times by annealing after the growth, reaching about 5 10 cm/s. Raman spectroscopy results suggest a coexistence of both 2H and 1T' MoTe phases in the studied samples.
arXiv comment8 pages, 4 figures
References in corpus (6)
- Indirect-to-direct band-gap crossover in few-layer MoTe
- Observation of the Type-II Weyl Semimetal Phase in MoTe2
- Structural and Electrical Properties of MoTe and MoSe Grown by Molecular Beam Epitaxy
- Fermi arcs and their topological character in the candidate type-II Weyl semimetal MoTe2
- The extremely large magnetoresistance in the Candidate Type-II Weyl semimetal MoTe2
- Highly tunable nonlinear Hall effects induced by spin-orbit couplings in strained polar transition-metal dichalcogenides
Cited by in corpus (3)
- Persistence of charge ordering instability to Coulomb engineering in the excitonic insulator candidate TiSe
- Photoluminescence efficiency of MBE-grown MoSe monolayers featuring sharp excitonic lines and diverse grain structures
- Molecular beam epitaxy growth of cadmium telluride structures on hexagonal boron nitride