Electron Collision Cross Sections in Tetrafluoropropene HFO1234ze(E) for Gas Mixtures in Resistive Plate Chambers

Antonio Bianchi; Alessandro Ferretti; Martino Gagliardi; Ermanno Vercellin

paper

Electron Collision Cross Sections in Tetrafluoropropene HFO1234ze(E) for Gas Mixtures in Resistive Plate Chambers

arXiv:2103.08643

Abstract

In recent years, there has been growing interest in tetrafluoropropene HFO1234ze(E) (C $_{3}$ H $_{2}$ F $_{4}$ ) for Resistive Plate Chambers (RPCs). This novel gas is considered a promising alternative to the standard mixtures currently used in RPCs, thanks to its low global warming potential. The knowledge of electron collision cross sections in C $_{3}$ H $_{2}$ F $_{4}$ enables reliable predictions of electron transport coefficients and reaction rates in C $_{3}$ H $_{2}$ F $_{4}$ -based gas mixtures. This allows for optimizing the C $_{3}$ H $_{2}$ F $_{4}$ -based gas mixtures to achieve the desired performance in RPCs. From measurements of electron transport coefficients and reaction rates, a complete set of scattering cross sections for electrons in C $_{3}$ H $_{2}$ F $_{4}$ has been derived. Validation of the electron collision cross sections is achieved through systematic comparisons of electron swarm parameters with experimental data in both pure C $_{3}$ H $_{2}$ F $_{4}$ and C $_{3}$ H $_{2}$ F $_{4}$ /CO $_{2}$ gas mixtures. Given the influence of electron attachment in C $_{3}$ H $_{2}$ F $_{4}$ by the gas density, this work also includes precise calculations of the critical electric field strength in such mixtures. This set of cross sections has been further utilized to compute the effective ionization Townsend coefficient in gas mixtures containing C $_{3}$ H $_{2}$ F $_{4}$ , potentially applicable for RPCs.

Added section "Tetrafluoropropene-based Gas Mixtures for Resistive Plate Chambers"