Fast Pattern Recognition for Electron Emission Micrograph Analysis
arXiv:2012.03578
Abstract
In this work, a pattern recognition algorithm was developed to process and analyze electron emission micrographs. Various examples of dc and rf emission are given that demonstrate this algorithm applicability to determine emitters spatial location and distribution and calculate apparent emission area. The algorithm is fast and only takes 10 seconds to process and analyze one micrograph using resources of an Intel Core i5.