Soft x-ray irradiation induced metallization of layered TiNCl

Abstract

We have performed soft x-ray spectroscopy in order to study the photoirradiation time dependence of the valence band structure and chemical states of layered transition metal nitride chloride TiNCl. Under the soft x-ray irradiation, the intensities of the states near the Fermi level (EF) and the Ti3+ component increased, while the Cl 2p intensity decreased. Ti 2p-3d resonance photoemission spectroscopy confirmed a distinctive Fermi edge with Ti 3d character. These results indicate the photo-induced metallization originates from deintercalation due to Cl desorption, and thus provide a new carrier doping method that controls the conducting properties of TiNCl.

References in corpus (4)

• Coherent and Incoherent States of Electron-doped SrTiO3
• Engineering two-dimensional electron gases at the (001) and (101) surfaces of TiO2 anatase using light
• Spin and Charge Fluctuations in the $\alpha$-structure Layered Nitride Superconductors
• Comment on "Superconductivity in electron-doped layered TiNCl with variable interlayer coupling"