Prediction of two-dimensional ferromagnetic ferroelectric VOF monolayer
arXiv:2010.00234 · doi:10.1039/D0CP04208K
Abstract
Nowadays, designing and searching for materials with multiple functional characteristics are the key to achieving high-performance electronic devices. Among many candidates, two-dimensional multiferroic materials have great potential to be applied in highly-integrated magnetoelectric devices, such as high-density non-volatile memories. Here, we predict a two-dimensional material VOF2 monolayer to possess intrinsic ferroelectric and ferromagnetic properties. The VOF monolayer own the largest in-plane ferroelectric polarization ( pC/m) in the family of VO (: halogen) oxyhalides. Different from other VO monolayers whose magnetic ground states are antiferromagnetic or noncollinear spiral textures, the VOF monolayer owns a robust ferromagnetic ground state, which is rare but highly desirable. Our theoretical prediction provides a good candidate and starting point for the further pursuit of more two-dimensional multiferroic materials with high-performance magnetoelectricity.
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