Hyper Resolution Two Photon Direct Laser Writing using ENZ Nano-Cavity
arXiv:2007.13509 · doi:10.1002/adma.202008644
Abstract
A novel technique is reported to improve the resolution of two-photon direct laser writing lithography. Thanks to the high collimation enabled by extraordinary (near-zero) metamaterial features, ultra-thin dielectric hyper resolute nanostructures are within reach. With respect to the standard direct laser writing approach, a size reduction of and , in height and width respectively, is achieved with the height of the structures adjustable between 5nm and 50nm. The retrieved 2D fabrication parameters are exploited for fabricating hyper resolute 3D structures. In particular, a highly detailed dielectric bas-relief (500 nm of full height) of Da Vinci's \textit{"Lady with an Ermine"} has been realized. The proof-of-concept result shows intriguing cues for the current and trendsetting research scenario in anti-counterfeiting applications, flat optics and photonics.
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References in corpus (6)
- Subwavelength-thick Lenses with High Numerical Apertures and Large Efficiency Based on High Contrast Transmitarrays
- Multiwavelength Achromatic Metasurfaces by Dispersive Phase Compensation
- Global optimization of dielectric metasurfaces using a physics-driven neural network
- Electrically Driven Varifocal Silicon Metalens
- Enhanced and directional single photon emission in hyperbolic metamaterials
- Green function for hyperbolic media