Wafer-scale low-loss lithium niobate photonic integrated circuits

Abstract

Thin-film lithium niobate (LN) photonic integrated circuits (PICs) could enable ultrahigh performance in electro-optic and nonlinear optical devices. To date, realizations have been limited to chip-scale proof-of-concepts. Here we demonstrate monolithic LN PICs fabricated on 4- and 6-inch wafers with deep ultraviolet lithography and show smooth and uniform etching, achieving 0.27 dB/cm optical propagation loss on wafer-scale. Our results show that LN PICs are fundamentally scalable and can be highly cost-effective.

5 pages, 4 figures

References in corpus (4)

• Optical Quantum Computing
• Monolithic Ultrahigh-Q Lithium Niobate Microring Resonator
• Quantum photonics at telecom wavelengths based on lithium niobate waveguides
• High coupling efficiency grating couplers on lithium niobate on insulator