Alpha spectrometric characterization of thin U sources for Th production
arXiv:2004.02571 · doi:10.1515/ract-2020-0032
Abstract
Four different techniques were applied for the production of U alpha recoil ion sources, providing Th ions. They were compared with respect to a minimum energy spread of the Th recoil ions, using the emitted alpha particles as an indicator. The techniques of Molecular Plating, Drop-on-Demand inkjet printing, chelation from dilute nitric acid solution on chemically functionalized silicon surfaces, and self-adsorption on passivated titanium surfaces were used. All fabricated sources were characterized by using alpha spectrometry, radiographic imaging, and scanning electron microscopy. A direct validation for the estimated recoil ion rate was obtained by collecting Th recoil ions from U recoil ion sources prepared by self-adsorption and Molecular Plating. The chelation and the self-adsorption based approaches appear most promising for the preparation of recoil ion sources delivering monochromatic recoil ions.
arXiv comment20 pages, 14 figures, 11 tables, ahead of print at Radiochim. Acta (2020)
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