Resist and Transfer Free Patterned CVD Graphene Growth on ALD Molybdenum Carbide Nano Layers

Abstract

Multilayer graphene (MLG) films were grown by chemical vapour deposition (CVD) on molybdenum carbide ($Mo{C}_x$) substrates. We fabricated the catalytic $Mo{C}_x$ films by plasma enhanced atomic layer deposition (PEALD). The mechanism of graphene growth is studied and analysed for amorphous and crystalline $Mo{C}_x$ films. In addition, the unique advantages of catalytic substrate PEALD are demonstrated in two approaches to graphene device fabrication. First, we present a complete bottom up, resist-free patterned graphene growth (GG) on pre-patterned $Mo{C}_x$ PEALD performed at 50${}^{\circ }C$. Selective CVD GG eliminates the need to pattern or transfer the graphene film to retain its pristine, as grown, qualities. Furthermore, we fabricated MLG directly on PEALD $Mo{C}_x$ on 100 nm suspended SiN membrane. We characterise the MLG qualities using Raman spectroscopy, and analyse the samples by optical microscopy, scanning electron microscopy and X-ray diffraction measurements. The techniques of graphene device manufacturing demonstrated here pave the path for large scale production of graphene applications.

Preprint V.3, 5 pages, 6 figures. Comments: the following sections have been edited- Abstract, Introduction, Discussion and conclusions and Acknowledgements. Plots and graphics have been modified for better visualisation of data

References in corpus (3)

• Effect of oxygen plasma etching on graphene studied with Raman spectroscopy and electronic transport
• Tailored Molybdenum Carbide Properties and Graphitic Nano Layer Formation by Plasma and Ion Energy Control during Plasma Enhanced ALD
• Control of Graphene Layer Thickness Grown on Plasma Enhanced Atomic Layer Deposition of Molybdenum Carbide

Cited by in corpus (1)

• Control of Graphene Layer Thickness Grown on Plasma Enhanced Atomic Layer Deposition of Molybdenum Carbide