Putative hybridization gap in CaMnBi under applied pressure
arXiv:1907.09984 · doi:10.1103/PhysRevB.100.045108
Abstract
We report electrical transport measurements on CaMnBi single crystals under applied pressure. At ambient pressure and high temperatures, CaMnBi behaves as a single-band semimetal hosting Néel order at ~K. At low temperatures, multi-band behavior emerges along with an activated behavior typical of degenerate semiconductors. The activation gap is estimated to be ~K. Applied pressure not only favors the antiferromagnetic order at a rate of 0.40(2)~K/kbar, but also enhances the activation gap at ~kbar by about ~\%. This gap enhancement is typical of correlated narrow-gap semiconductors such as FeSi and CeBiPt, and places CaMnBi as a Mn-based hybridization-gap semiconductor candidate. \textit{Ab initio} calculations based on the density functional theory are shown to be insufficient to describe the ground state of CaMnBi.
7 pages, 5 figures
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