Bi-Arrhenius diffusion and surface trapping of ${}^8$Li${}^{+}$ in rutile TiO${}_2$

Abstract

We report measurements of the diffusion rate of isolated ion-implanted ${}^8$Li${}^{+}$ within $\sim$120 nm of the surface of oriented single-crystal rutile TiO${}_2$ using a radiotracer technique. The $\alpha$-particles from the ${}^8$Li decay provide a sensitive monitor of the distance from the surface and how the depth profile of ${}^8$Li evolves with time. The main findings are that the implanted Li${}^{+}$ diffuses and traps at the (001) surface. The T-dependence of the diffusivity is described by a bi-Arrhenius expression with activation energies of 0.3341(21) eV above 200 K, whereas at lower temperatures it has a much smaller barrier of 0.0313(15) eV. We consider possible origins for the surface trapping, as well the nature of the low-T barrier.

5 pages, 4 figures