The chemical potential and the work function of a metal film on a dielectric substrate
arXiv:1804.08884 · doi:10.1080/09500839.2019.1605219
Abstract
The chemical potential and the work function of an aluminum film, which (1) is in vacuum and (2) is located on a dielectric substrate is calculated within the model of non-interacting electrons located in an asymmetric rectangular potential well. For the first time in calculating these values for such a model of a metal film, the electroneutrality condition is correctly taken into account. This leads to the correct behavior of these values, namely: if the thickness of the film increases, these characteristics tend to their bulk values.
arXiv comment11 pages, 3 figures
References in corpus (5)
- Energetics of metal slabs and clusters: the rectangle-box model
- Effect of Coulomb interaction on chemical potential of metal film
- Semi-infinite jellium: thermodynamic potential, chemical potential, surface energy
- Semi-infinite jellium: Step potential model
- The Jellium Edge and the Size Effect of the Chemical Potential and Surface Energy in Metal Slabs