Domain Wall Orientations in Ferroelectric Superlattices Probed with Synchrotron X-Ray Diffraction

Abstract

Ferroelectric domains in PbTiO${}_3$/SrTiO${}_3$ superlattices were studied using synchrotron X-ray diffraction. Macroscopic measurements revealed a change in the domain wall orientation from $\left\{100\right\}$ to $\left\{110\right\}$ crystallographic planes with increasing temperature. The temperature range of this reorientation depends on the ferroelectric layer thickness and domain period. Using a nanofocused beam, local changes in domain wall orientation within the buried ferroelectric layers were imaged, both in structurally uniform regions of the sample and near defect sites and argon ion etched patterns. Domain walls were found to exhibit preferential alignment with the straight edges of the etched patterns as well as with structural features associated with defect sites. The distribution of out-of-plane lattice parameters was mapped around one such feature, showing that it is accompanied by inhomogeneous strain and large strain gradients.

References in corpus (7)

• Conduction through 71o domain walls in BiFeO3 thin films
• Ferroelectricity and tetragonality in ultrathin PbTiO3 films
• Domain enhanced interlayer coupling in ferroelectric/paraelectric superlattices
• Very large dielectric response of thin ferroelectric films with the dead layers
• Tuning of the depolarization field and nanodomain structure in ferroelectric thin films
• Ferroelectricity at ferroelectric domain walls
• Universal Properties of Ferroelectric Domains

Cited by in corpus (5)

• Angular x-ray cross-correlation analysis (AXCCA): Basic concepts and recent applications to soft matter and nanomaterials
• Role of ferroelectric polarization during growth of highly strained ferroelectrics revealed by in-situ x-ray diffraction
• Domain alignment within ferroelectric/dielectric PbTiO${}_3$/SrTiO${}_3$ superlattice nanostructures
• Assessing the nature of nanoscale ferroelectric domain walls in lead titanate multilayers
• Origin of ferroelectric domain wall alignment with surface trenches in ultrathin films