Superconducting Through-Silicon Vias for Quantum Integrated Circuits

Abstract

We describe a microfabrication process for superconducting through-silicon vias appropriate for use in superconducting qubit quantum processors. With a sloped-wall via geometry, we can use non-conformal metal deposition methods such as electron-beam evaporation and sputtering, which reliably deposit high quality superconducting films. Via superconductivity is validated by demonstrating zero via-to-via resistance below the critical temperature of aluminum.

5 pages, 8 figures

References in corpus (1)

• Surface codes: Towards practical large-scale quantum computation

Cited by in corpus (12)

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• Computational modeling of decay and hybridization in superconducting circuits