Development of Particle-in-Cell Simulation in a Two Dimensional Trench Geometry

Abstract

A two dimensional electrostatic Particle-in-Cell simulation code is developed to investigate anisotropy of ions in a trench geometry for plasma etching. The numerical simulation results suggest that if the trench width is larger than Debye length scale, anisotropy can be lost due to potential development across the trench. Furthermore, the effects of ion charge build up on the trench bottom is investigated, which can degrade the anisotropy.