Integrated micro-plasmas in silicon operating in helium

Abstract

Microplasma arrays operating in helium in a DC regime have been produced in silicon microre-actors. Cathode boundary layer (CBL) type microdevices were elaborated using clean room facilities and semiconductor processing techniques. Ignition of the micro-discharge arrays having either 50 or 100 m diameter cavities was studied. Two different structures (isotropically etched or anisotropically etched cavity) and various conditions (the two different voltage polarities, pressures etc.) were investigated. 100 microdis-charges of 50 m diameter could be ignited in parallel at 1000 torr. At high current, some parasitic and transient sparks appeared at the edge of the sample. When the polarization was reversed (cathode side corresponding the opened electrode), more current was needed to light all the microdischarges. A thermally affected zone around the hole on the anode side was obtained after operation.

References in corpus (2)

• Integrated micro-plasmas in silicon operating in helium
• Effect of limiting the cathode surface on direct current microhollow cathode discharge in helium

Cited by in corpus (10)

• Towards an integrated modeling of the plasma-solid interface
• Electron surface layer at the interface of a plasma and a dielectric wall
• Wall charge and potential from a microscopic point of view
• Integrated micro-plasmas in silicon operating in helium
• Kinetic modeling of the electronic response of a dielectric plasma-facing solid
• Electron kinetics at the plasma interface
• Kinetic modeling of the electric double layer at a dielectric plasma-solid interface
• Measuring the plasma-wall charge by infrared spectroscopy
• Photonic Interactions with Semiconducting Barrier Discharges
• Charge kinetics across a negatively biased semiconducting plasma-solid interface