Quantum atomic lithography via cross-cavity optical Stern-Gerlach setup

Abstract

We present a fully quantum scheme to perform 2D atomic lithography based on a cross-cavity optical Stern-Gerlach setup: an array of two mutually orthogonal cavities crossed by an atomic beam perpendicular to their optical axes, which is made to interact with two identical modes. After deriving an analytical solution for the atomic momentum distribution, we introduce a protocol allowing us to control the atomic deflection by manipulating the amplitudes and phases of the cavity field states.

References in corpus (3)

• Quantum Non-demolition Detection of Single Microwave Photons in a Circuit
• Rotating optical cavity experiment testing Lorentz invariance at the 10^{-17} level
• Visualization of superposition states and Raman processes with two-dimensional atomic deflection

Cited by in corpus (5)

• Bright and Dark States of Light: The quantum Origin of Classical Interference
• Entanglement detection via atomic deflection
• Suppression of quantum noises in coherent atom lithography through squeezing
• Engineering Atom-Photon Hybridization with Density-Modulated Atomic Ensembles in Coupled Cavities
• Coherent deflection of atomic samples and positional mesoscopic superpositions