Lithography-free sub-100nm nanocone array antireflection layer for low-cost silicon solar cell

Abstract

High density and uniformity sub-100nm surface oxidized silicon nanocone forest structure is created and integrated onto the existing texturization microstructures on photovoltaic device surface by a one-step high throughput plasma enhanced texturization method. We suppressed the broadband optical reflection on chemically textured grade-B silicon solar cells for up to 70.25% through this nanomanufacturing method. The performance of the solar cell is improved with the short circuit current increased by 7.1%, fill factor increased by 7.0%, conversion efficiency increased by 14.66%. Our method demonstrates the potential to improve the photovoltaic device performance with low cost high and throughput nanomanufacturing technology.

References in corpus (2)

• Surface plasmon enhanced broadband spectrophotometry on black silver substrates
• Quick Detection of Contaminants Leaching from Polypropylene Centrifuge Tube with Surface Enhanced Raman Spectroscopy and Ultra Violet Absorption Spectroscopy

Cited by in corpus (3)

• Monolithic Integrations of Slanted Silicon Nanostructures on 3D Microstructures and Their Application to Surface Enhanced Raman Spectroscopy
• Black Silicon Solar Thin-film Microcells Integrating Top Nanocone Structures for Broadband and Omnidirectional Light-Trapping
• Lithography-Free, Low-Cost Method for Improving Photodiode Performance by Etching Silicon Nanocones as Antireflection Layer