Improved surface quality of anisotropically etched silicon {111} planes for mm-scale integrated optics

Abstract

We have studied the surface quality of millimeter-scale optical mirrors produced by etching CZ and FZ silicon wafers in potassium hydroxide to expose the $\{111\}$ planes. We find that the FZ surfaces have four times lower noise power at spatial frequencies up to $500{mm}^{-1}$. We conclude that mirrors made using FZ wafers have higher optical quality.

References in corpus (4)

• A surface-patterned chip as a strong source of ultra-cold atoms for quantum technologies
• Integrated magneto-optical traps on a chip
• Characteristics of integrated magneto-optical traps for atom chips
• ICP polishing of silicon for high quality optical resonators on a chip

Cited by in corpus (1)

• Design and fabrication of diffractive atom chips for laser cooling and trapping