Exchange Field-Mediated Magnetoresistance in the Correlated Insulator Phase of Be Films
arXiv:1211.1663 · doi:10.1103/PhysRevLett.109.147207
Abstract
We present a study of the proximity effect between a ferromagnet and a paramagnetic metal of varying disorder. Thin beryllium films are deposited onto a 5 nm-thick layer of the ferromagnetic insulator EuS. This bilayer arrangement induces an exchange field, , of a few tesla in low resistance Be films with sheet resistance , where is the quantum resistance. We show that survives in very high resistance films and, in fact, appears to be relatively insensitive to the Be disorder. We exploit this fact to produce a giant low-field magnetoresistance in the correlated insulator phase of Be films with .
To be published in Physical Review Letters
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