Anomalous Hall effect in the Co-based Heusler compounds CoFeSi and CoFeAl
arXiv:1109.5498 · doi:10.1063/1.3678323
Abstract
The anomalous Hall effect (AHE) in the Heusler compounds CoFeSi and CoFeAl is studied in dependence of the annealing temperature to achieve a general comprehension of its origin. We have demonstrated that the crystal quality affected by annealing processes is a significant control parameter to tune the electrical resistivity as well as the anomalous Hall resistivity . Analyzing the scaling behavior of in terms of points to a temperature-dependent skew scattering as the dominant mechanism in both Heusler compounds.