Mechanisms for the Near-UV Photodissociation of CHI on DO/Cu(110)
arXiv:1107.4622 · doi:10.1063/1.4770225
Abstract
The system of CHI adsorbed on submonolayer, monolayer and multilayer thin films of DO on Cu(110) has been studied by measuring the time-of-flight (TOF) distributions of the desorbing CH fragments after photodissociation using linearly polarized =248nm light. For multilayer DO films (1-120ML), the photodissociation is dominated by neutral photodissociation via the "A-band" absorption of CHI. The polarization and angle dependent variation in the observed TOF spectra of the CH photofragments find that dissociation is largely via the excited state, but that also a contribution via the excitation can be identified. The photodissociation results also indicate that the CHI adsorbed on DO forms close-packed islands at submonolayer coverages, with a mixture of C-I bond axis orientations. For submonolayer quantities of DO we have observed a contribution to CHI photodissociation via dissociative electron attachment (DEA) by photoelectrons. The observed DEA is consistent with delocalized photoelectrons from the substrate causing the observed dissociation -- we do not find evidence for a DEA mechanism via the temporary solvation of photoelectrons in localized states of the DO ice.