Dynamical model for the formation of patterned deposits at receding contact lines
arXiv:1008.4334 · doi:10.1103/PhysRevLett.106.077801
Abstract
We describe the formation of deposition patterns that are observed in many different experiments where a three-phase contact line of a volatile nanoparticle suspension or polymer solution recedes. A dynamical model based on a long-wave approximation predicts the deposition of irregular and regular line patterns due to self-organised pinning-depinning cycles corresponding to a stick-slip motion of the contact line. We analyze how the line pattern properties depend on the evaporation rate and solute concentration.
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Cited by in corpus (15)
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