Atom lithography without laser cooling
arXiv:0908.2733 · doi:10.1007/s00340-009-3867-3
Abstract
Using direct-write atom lithography, Fe nanolines are deposited with a pitch of 186 nm, a full width at half maximum (FWHM) of 50 nm, and a height of up to 6 nm. These values are achieved by relying on geometrical collimation of the atomic beam, thus without using laser collimation techniques. This opens the way for applying direct-write atom lithography to a wide variety of elements.
7 pages, 11 figures