Measurement of surface alpha-acrivity of different samples with ion pulse ionization chamber
arXiv:0711.2614
Abstract
The construction of an ion pulse ionization chamber aimed at measuring ultra-low levels of surface alpha-activity of different samples is described. The results of measurement carried out with alpha-source and copper samples and light-reflecting film VM2000 are presented.
6 pages, 7 postscript figures, talk at the XIV-th Int. School "Particles and Cosmology"