The effect of RF-DC plasma N2-H2 in the selective hardening process for micro-patterned AISI420

Hengky Herdianto, Dionisius Johanes Djoko Herry Santjojo, Masruroh

The high density of RF-DC plasma N2-H2 was used to make precise micro-texturing onto AISI420 has complex textured geometry. The original 2D micro-patterns were drawn onto substrate…