output
20122026
most citedLow Temperature Nanoscale Electronic Transport on the MoS_2 surface

22 citations

10 papers

cs.AR2026

DSPE: An Energy-Efficient Edge Processor for DeepSeek Inference with MerkleTree-based Incremental Pruning, Multi-Stage Boothing Lookup and Dynamic Adaptive Posit Processing

Yuhan Zhang, Zhou Wang, Zhou Shu +8

In recent years, DeepSeek has achieved strong inference performance but remains hard to deploy on energy-constrained edge devices. This paper presents the DeepSeek Processing Eleme…

cs.SE2026

How Effective Are NPM Malicious Package Detectors? A Large-Scale Empirical Study

Wenbo Guo, Zhongwen Chen, Zhengzi Xu +7

The NPM ecosystem faces escalating threats from malicious packages that exploit its open publication model. While numerous detection tools have been proposed, they are evaluated on…

cs.SE2026★ 1 cited

Bridging Expert Reasoning and LLM Detection: A Knowledge-Driven Framework for Malicious Packages

Wenbo Guo, Shiwen Song, Jiaxun Guo +5

Open-source ecosystems such as NPM and PyPI are increasingly targeted by supply chain attacks, yet existing detection methods either depend on fragile handcrafted rules or data-dri…

eess.SY2024★ 7 cited

Recommender systems and reinforcement learning for human-building interaction and context-aware support: A text mining-driven review of scientific literature

Wenhao Zhang, Matias Quintana, Clayton Miller

The indoor environment significantly impacts human health and well-being; enhancing health and reducing energy consumption in these settings is a central research focus. With the a…

physics.app-ph2021★ 3 cited

Impact of FeB insertion on the properties of dual-MgO perpendicular magnetic tunnel junctions

Enlong Liu, Taeyoung Lee, Hyunsoo Yang

We explore the impact of Fe80B20 inserted at both CoFeB/MgO interfaces of dual-MgO free layers (FLs) in bottom-pinned magnetic tunnel junctions (MTJs). MTJ sta…

cs.OH2018

An Automated System for Checking Lithography Friendliness of Standard Cells

I-Lun Tseng, Yongfu Li, Valerio Perez +3

At advanced process nodes, lithography weakpoints can exist in physical layouts of integrated circuit designs even if the layouts pass design rule checking (DRC). Existence of lith…